Main > NUCLEIC ACID > Protecting Groups > Photocleavable Protecting Groups

Product USA. A

PATENT ASSIGNEE'S COUNTRY USA
UPDATE 11.00
PATENT ASSIGNEE Affymetrix
PATENT CLAIMS Ar-CH2-O-CO-X
- Ar = Fused polycyclic aryl or vinylogous deriv thereof
- X = Leaving group
PATENT PHOTOCOPY Available on request

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