| PATENT ASSIGNEE'S COUNTRY | Belgium |
| UPDATE | 12.99 |
| PATENT ASSIGNEE | Agfa-Gevaert NV |
| PATENT CLAIMS |
Claim 1 Positive-working radiation-sensitive recording material capa ble of being used for the production of planographic printing plates, comprising - An Al support , grained in NO3H, then cleaned in SO4H2, anodized in SO4H2, & subsequently hydrophilized with compd comprising at least one unit with a phosphonic acid group - Radiation-sensitive layer comprising a) Radiation-sensiti ve 1,2-naphthoquinone-2-diazide-4- or 5 sulfonic acid ester of a polycondensate having phenolic -OH, said polyconden sate being obtained by reacting phenolic compd with an aldehyde or ketone; b) Novolak, as an alkali-soluble binder resin; c) Vinyl polymer comprising at least one unit having lateral hydroxyphenyl group; d) Clathrate; e) Low MW compd which comprises at least one acidic H atom; f) Silica gel particles having max diam. 15 micro.m Claim 19: Method for prepg planographic printing plates - Bringing a recording material according to claim 1 into con tact with a film original in a vacuum contact frame - Imagewise irradiating said material - Developing said material |
| PATENT PHOTOCOPY | Available on request |
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