| PATENT ASSIGNEE'S COUNTRY | USA |
| UPDATE | 09.00 |
| PATENT ASSIGNEE | Advanced Technology Materials |
| PATENT CLAIMS |
Method of forming a low dielectric constant parylene film on a substrate - Providing a liquid phase precursor comprising a parylene source reagent as neat liquid - Flash vaporizing said precursor in a flash vaporizer/pyroly tic cracking unit to produce flash vaporized precursor - Pyrolytically cracking the flash vaporized precursor in situ in the flash vaporizer/cracking unit to produce a precursor vapor which includes parylene source monomer &/or reactive radical species - Contacting the said vapor with substrate under conditions producing condensation of the said monomer to form polymeric film of parylene on substrate |
| PATENT PHOTOCOPY | Available on request |
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