| PATENT ASSIGNEE'S COUNTRY | USA |
| UPDATE | 10.00 |
| PATENT ASSIGNEE | Advanced Micro Devices |
| PATENT CLAIMS |
Method of processing a semiconductor structure including a positive photoresist thereon - Exposing structure including photoresist to actinic radiation - Contacting structure including exposed photoresist with soln comprising deionized water & 0.05-3% of surfactant, wherein the soln has surface tension < 60 dynes/cm - Developing the positive photoresist with an aq developer |
| PATENT PHOTOCOPY | Available on request |
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