| PATENT ASSIGNEE'S COUNTRY | USA |
| UPDATE | 06.00 |
| PATENT ASSIGNEE | UOP |
| PATENT CLAIMS |
Process for removing contaminants from gas stream, comprising passing gas stream through sequential beds of adsorbents - First adsorbent bed comprising adsorbent having strong affinity for water so as to remove water - Second adsorbent bed comprising Ag-exchanged molecu lar sieve having FAU structure for removal of S compds - Third adsorbent bed having strong affinity for S compds contg S=C, S=O, & S-C functionalities selected from group: Molecular sieves having MFI structure with Si:Al ratio > 10, ZSM-12 & ZSM-23 - Fourth adsorbent bed comprising alumina with adsorption capacity for S-contg compds & halocarbons |
| PATENT PHOTOCOPY | Available on request |
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