| PATENT ASSIGNEE'S COUNTRY | Taiwan |
| UPDATE | 11.99 |
| PATENT ASSIGNEE | United Microelectronics Corp |
| PATENT CLAIMS |
Method of forming an electronic device - Providing a gate oxide layer over substrate - Providing conducting layer over gate oxide layer - Providing resist layer over conducting layer - Providing charge dissipation layer over resist layer, inclu ding conducting polymer structure -{-C6H4-N[(CH2)3-R]-C6H4-N[(CH2)3-R]-C6H4-N=C6H4=N -}x; R = acid; x = designates that structure is repeated - Exposing resist layer to EB to form pattern in resist layer - Developing resist layer |
| PATENT PHOTOCOPY | Available on request |
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