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Section:	Main.ELECTRONICS..Chemicals.Silica.Patent.Claims.Claim 1: Production Process with.Ti Impurity Concn.=0.3-1.2 ppm.:.a) Alkali Silicate Aq. Soln.+.InOrganic Acid=Acidic Silica Sol;.b) Sol+Hydrogen Peroxide Treat.;.c) Adjust pH=0-5 by NaOH Addition.; d) Purify Sol by Contact with.Cationic Ion Exchange Resin; e).Neutralize Sol with Aq. Alkali Soln..; Add Sol to Aq Ammonium Salt Soln..; g) Separate Precipitated Silica..Patent Assignee
Code:	55802
Product:	USA. M
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