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Section: Main.POLYMERS.Living (Controlled) Polymerization.Radical Polymerization.Block CoPolymers.Xanthate based Technology.DiBlock CoPolymers..Hydrophilic DiBlock CoPolymers.Charged Block. Neutral Block..Patent.Claims.Claim 1: Mineral Particle Colloids.in Aq. Dispersion Prepn.: a) Add.Precursor (Metal Cation Mineral.Salt) in Aq. Soln. = Prodt. Partial.Hydolysis of Prodt. b) Complex with.Water-Soluble Hydrophilic.Anionic/NonIonic DiBlock CoPolymer.& c) Hydrolysis of Precursor to.obtain Controlled Growth. Claim 2:.Colloid Size=2-500 nm. Claim 3:.Base Hydrolysis. Claims 5,6:.Base: NaOH; KOH; Ca(OH)2. Claim 12:.Metal Cation: Cu; Al; Ce or.Lanthanum. Patent Assignee
Code: 55324
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